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Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method
The paper presents a method for the high-resolution production of polymer nanopatterns with controllable geometrical parameters by means of a single-spot electron-beam lithography technique. The essence of the method entails the overexposure of a positive-tone resist, spin-coated onto a substrate wh...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Beilstein-Institut
2015
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4419585/ https://www.ncbi.nlm.nih.gov/pubmed/25977869 http://dx.doi.org/10.3762/bjnano.6.101 |