Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns

Line patterns produced by lamellae- and cylinder-forming block copolymer (BCP) thin films are of widespread interest for their potential to enable nanoscale patterning over large areas. In order for such patterning methods to effectively integrate with current technologies, the resulting patterns ne...

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Detalles Bibliográficos
Autores principales: Murphy, Jeffrey N., Harris, Kenneth D., Buriak, Jillian M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2015
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4514826/
https://www.ncbi.nlm.nih.gov/pubmed/26207990
http://dx.doi.org/10.1371/journal.pone.0133088

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4514826/
https://www.ncbi.nlm.nih.gov/pubmed/26207990
http://dx.doi.org/10.1371/journal.pone.0133088

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