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Self-Aligned Colloidal Lithography for Controllable and Tuneable Plasmonic Nanogaps
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
BlackWell Publishing Ltd
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4515099/ https://www.ncbi.nlm.nih.gov/pubmed/25505000 http://dx.doi.org/10.1002/smll.201402639 |