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Top-Down CMOS-NEMS Polysilicon Nanowire with Piezoresistive Transduction

A top-down clamped-clamped beam integrated in a CMOS technology with a cross section of 500 nm × 280 nm has been electrostatic actuated and sensed using two different transduction methods: capacitive and piezoresistive. The resonator made from a single polysilicon layer has a fundamental in-plane re...

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Detalles Bibliográficos
Autores principales: Marigó, Eloi, Sansa, Marc, Pérez-Murano, Francesc, Uranga, Arantxa, Barniol, Núria
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4541920/
https://www.ncbi.nlm.nih.gov/pubmed/26184222
http://dx.doi.org/10.3390/s150717036