Damage evaluation in graphene underlying atomic layer deposition dielectrics

Based on micro-Raman spectroscopy (μRS) and X-ray photoelectron spectroscopy (XPS), we study the structural damage incurred in monolayer (1L) and few-layer (FL) graphene subjected to atomic-layer deposition of HfO(2) and Al(2)O(3) upon different oxygen plasma power levels. We evaluate the damage lev...

Descripción completa

Detalles Bibliográficos
Autores principales: Tang, Xiaohui, Reckinger, Nicolas, Poncelet, Olivier, Louette, Pierre, Ureña, Ferran, Idrissi, Hosni, Turner, Stuart, Cabosart, Damien, Colomer, Jean-François, Raskin, Jean-Pierre, Hackens, Benoit, Francis, Laurent A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4550929/
https://www.ncbi.nlm.nih.gov/pubmed/26311131
http://dx.doi.org/10.1038/srep13523

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4550929/
https://www.ncbi.nlm.nih.gov/pubmed/26311131
http://dx.doi.org/10.1038/srep13523

Ejemplares similares