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Direct evidence on Ta-Metal Phases Igniting Resistive Switching in TaO(x) Thin Film

A Ta/TaO(x)/Pt stacked capacitor-like device for resistive switching was fabricated and examined. The tested device demonstrated stable resistive switching characteristics including uniform distribution of resistive switching operational parameters, highly promising endurance, and retention properti...

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Detalles Bibliográficos
Autores principales: Kyu Yang, Min, Ju, Hyunsu, Hwan Kim, Gun, Lee, Jeon-Kook, Ryu, Han-Cheol
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4568465/
https://www.ncbi.nlm.nih.gov/pubmed/26365532
http://dx.doi.org/10.1038/srep14053
Descripción
Sumario:A Ta/TaO(x)/Pt stacked capacitor-like device for resistive switching was fabricated and examined. The tested device demonstrated stable resistive switching characteristics including uniform distribution of resistive switching operational parameters, highly promising endurance, and retention properties. To reveal the resistive switching mechanism of the device, micro structure analysis using high-resolution transmission electron microscope (HR-TEM) was performed. From the observation results, two different phases of Ta-metal clusters of cubic α-Ta and tetragonal β-Ta were founded in the amorphous TaO(x) mother-matrix after the device was switched from high resistance state (HRS) to low resistance state (LRS) by externally applied voltage bias. The observed Ta metal clusters unveiled the origin of the electric conduction paths in the TaO(x) thin film at the LRS.