High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field

Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit an...

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Detalles Bibliográficos
Autores principales: Wen, X., Datta, A., Traverso, L. M., Pan, L., Xu, X., Moon, E. E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4630802/
https://www.ncbi.nlm.nih.gov/pubmed/26525906
http://dx.doi.org/10.1038/srep16192

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4630802/
https://www.ncbi.nlm.nih.gov/pubmed/26525906
http://dx.doi.org/10.1038/srep16192

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