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High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit an...
Autores principales: | Wen, X., Datta, A., Traverso, L. M., Pan, L., Xu, X., Moon, E. E. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2015
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4630802/ https://www.ncbi.nlm.nih.gov/pubmed/26525906 http://dx.doi.org/10.1038/srep16192 |
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