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Effect of SiN(x) diffusion barrier thickness on the structural properties and photocatalytic activity of TiO(2) films obtained by sol–gel dip coating and reactive magnetron sputtering
We investigate the effect of the thickness of the silicon nitride (SiN(x)) diffusion barrier on the structural and photocatalytic efficiency of TiO(2) films obtained with different processes. We show that the structural and photocatalytic efficiency of TiO(2) films produced using soft chemistry (sol...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4660912/ https://www.ncbi.nlm.nih.gov/pubmed/26665074 http://dx.doi.org/10.3762/bjnano.6.207 |