Three Dimensional Sculpturing of Vertical Nanowire Arrays by Conventional Photolithography

Ordered nanoarchitectures have attracted an intense research interest recently because of their promising device applications. They are always fabricated by self-assembling building blocks such as nanowires, nanodots. This kind of bottom up approaches is limited in poor control over height, lateral...

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Detalles Bibliográficos
Autores principales: Shi, Run, Huang, Chengzi, Zhang, Linfei, Amini, Abbas, Liu, Kai, Shi, Yuan, Bao, Shuhan, Wang, Ning, Cheng, Chun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4700459/
https://www.ncbi.nlm.nih.gov/pubmed/26729069
http://dx.doi.org/10.1038/srep18886

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4700459/
https://www.ncbi.nlm.nih.gov/pubmed/26729069
http://dx.doi.org/10.1038/srep18886

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