Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation lithography for semiconductors and a variety of soft materials. It is imperative to simultaneously achieve many requirements such as a high resolution, orientation control of micro-domains, etch selectivity, rap...

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Detalles Bibliográficos
Autores principales: Seshimo, Takehiro, Maeda, Rina, Odashima, Rin, Takenaka, Yutaka, Kawana, Daisuke, Ohmori, Katsumi, Hayakawa, Teruaki
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4726028/
https://www.ncbi.nlm.nih.gov/pubmed/26782329
http://dx.doi.org/10.1038/srep19481

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4726028/
https://www.ncbi.nlm.nih.gov/pubmed/26782329
http://dx.doi.org/10.1038/srep19481

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