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Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute
The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation lithography for semiconductors and a variety of soft materials. It is imperative to simultaneously achieve many requirements such as a high resolution, orientation control of micro-domains, etch selectivity, rap...
Autores principales: | Seshimo, Takehiro, Maeda, Rina, Odashima, Rin, Takenaka, Yutaka, Kawana, Daisuke, Ohmori, Katsumi, Hayakawa, Teruaki |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4726028/ https://www.ncbi.nlm.nih.gov/pubmed/26782329 http://dx.doi.org/10.1038/srep19481 |
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