Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes

The design and operation of a simple, optically-accessible modular reactor for probing thermal thin film deposition processes, such as atomic layer deposition processes (ALD) and chemical vapor deposition (CVD), is described. This reactor has a nominal footprint of 225 cm(2) and a mass of approximat...

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Detalles Bibliográficos
Autores principales: Kimes, W. A., Sperling, B. A., Maslars, J. E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4730684/
https://www.ncbi.nlm.nih.gov/pubmed/26958438
http://dx.doi.org/10.6028/jres.120.005

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4730684/
https://www.ncbi.nlm.nih.gov/pubmed/26958438
http://dx.doi.org/10.6028/jres.120.005

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