Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes

The design and operation of a simple, optically-accessible modular reactor for probing thermal thin film deposition processes, such as atomic layer deposition processes (ALD) and chemical vapor deposition (CVD), is described. This reactor has a nominal footprint of 225 cm(2) and a mass of approximat...

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Autores principales: Kimes, W. A., Sperling, B. A., Maslars, J. E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4730684/
https://www.ncbi.nlm.nih.gov/pubmed/26958438
http://dx.doi.org/10.6028/jres.120.005
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author Kimes, W. A.
Sperling, B. A.
Maslars, J. E.
author_facet Kimes, W. A.
Sperling, B. A.
Maslars, J. E.
author_sort Kimes, W. A.
collection PubMed
description The design and operation of a simple, optically-accessible modular reactor for probing thermal thin film deposition processes, such as atomic layer deposition processes (ALD) and chemical vapor deposition (CVD), is described. This reactor has a nominal footprint of 225 cm(2) and a mass of approximately 6.6 kg, making it small enough to conveniently function as a modular component of an optical train. The design is simple, making fabrication straightforward and relatively inexpensive. Reactor operation is characterized using two infrared absorption measurements to determine exhaust times for tetrakis(dimethylamino)titanium and water, proto-typical ALD precursors, in a pressure and flow regime commonly used for ALD.
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spelling pubmed-47306842016-03-08 Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes Kimes, W. A. Sperling, B. A. Maslars, J. E. J Res Natl Inst Stand Technol Article The design and operation of a simple, optically-accessible modular reactor for probing thermal thin film deposition processes, such as atomic layer deposition processes (ALD) and chemical vapor deposition (CVD), is described. This reactor has a nominal footprint of 225 cm(2) and a mass of approximately 6.6 kg, making it small enough to conveniently function as a modular component of an optical train. The design is simple, making fabrication straightforward and relatively inexpensive. Reactor operation is characterized using two infrared absorption measurements to determine exhaust times for tetrakis(dimethylamino)titanium and water, proto-typical ALD precursors, in a pressure and flow regime commonly used for ALD. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2015-04-07 /pmc/articles/PMC4730684/ /pubmed/26958438 http://dx.doi.org/10.6028/jres.120.005 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Kimes, W. A.
Sperling, B. A.
Maslars, J. E.
Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes
title Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes
title_full Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes
title_fullStr Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes
title_full_unstemmed Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes
title_short Design and Operation of an Optically-Accessible Modular Reactor for Diagnostics of Thermal Thin Film Deposition Processes
title_sort design and operation of an optically-accessible modular reactor for diagnostics of thermal thin film deposition processes
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4730684/
https://www.ncbi.nlm.nih.gov/pubmed/26958438
http://dx.doi.org/10.6028/jres.120.005
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