The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II

A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY...

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Detalles Bibliográficos
Autores principales: Schäfers, F., Bischoff, P., Eggenstein, F., Erko, A., Gaupp, A., Künstner, S., Mast, M., Schmidt, J.-S., Senf, F., Siewert, F., Sokolov, A., Zeschke, Th.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: International Union of Crystallography 2016
Materias:
Photondiag2015 Workshop
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4733934/
https://www.ncbi.nlm.nih.gov/pubmed/26698047
http://dx.doi.org/10.1107/S1600577515020615

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4733934/
https://www.ncbi.nlm.nih.gov/pubmed/26698047
http://dx.doi.org/10.1107/S1600577515020615

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