Cargando…
The at-wavelength metrology facility for UV- and XUV-reflection and diffraction optics at BESSY-II
A technology center for the production of high-precision reflection gratings has been established. Within this project a new optics beamline and a versatile reflectometer for at-wavelength characterization of UV- and XUV-reflection gratings and other (nano-) optical elements has been set up at BESSY...
| Autores principales: | , , , , , , , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
International Union of Crystallography
2016
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4733934/ https://www.ncbi.nlm.nih.gov/pubmed/26698047 http://dx.doi.org/10.1107/S1600577515020615 |