Directed block copolymer self-assembly implemented via surface-embedded electrets

Block copolymer (BCP) nanolithography is widely recognized as a promising complementary approach to circumvent the feature size limits of conventional photolithography. The directed self-assembly of BCP thin film to form ordered nanostructures with controlled orientation and localized pattern has be...

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Detalles Bibliográficos
Autores principales: Wu, Mei-Ling, Wang, Dong, Wan, Li-Jun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4756386/
https://www.ncbi.nlm.nih.gov/pubmed/26876792
http://dx.doi.org/10.1038/ncomms10752

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4756386/
https://www.ncbi.nlm.nih.gov/pubmed/26876792
http://dx.doi.org/10.1038/ncomms10752

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