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Directed block copolymer self-assembly implemented via surface-embedded electrets

Block copolymer (BCP) nanolithography is widely recognized as a promising complementary approach to circumvent the feature size limits of conventional photolithography. The directed self-assembly of BCP thin film to form ordered nanostructures with controlled orientation and localized pattern has be...

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Detalles Bibliográficos
Autores principales:	Wu, Mei-Ling, Wang, Dong, Wan, Li-Jun
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group 2016
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4756386/ https://www.ncbi.nlm.nih.gov/pubmed/26876792 http://dx.doi.org/10.1038/ncomms10752

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