Cargando…
A novel approach of chemical mechanical polishing using environment-friendly slurry for mercury cadmium telluride semiconductors
A novel approach of chemical mechanical polishing (CMP) is developed for mercury cadmium telluride (HgCdTe or MCT) semiconductors. Firstly, fixed-abrasive lapping is used to machine the MCT wafers, and the lapping solution is deionized water. Secondly, the MCT wafers are polished using the developed...
| Autores principales: | , , , , , |
|---|---|
| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2016
|
| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4772544/ https://www.ncbi.nlm.nih.gov/pubmed/26926622 http://dx.doi.org/10.1038/srep22466 |