Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing Applications

A top-down nanofabrication approach is used to develop silicon nanowires from silicon-on-insulator (SOI) wafers and involves direct-write electron beam lithography (EBL), inductively coupled plasma-reactive ion etching (ICP-RIE) and a size reduction process. To achieve nanometer scale size, the cruc...

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Detalles Bibliográficos
Autores principales: M. N, M. Nuzaihan, Hashim, U., Md Arshad, M. K., Ruslinda, A. Rahim, Rahman, S. F. A., Fathil, M. F. M., Ismail, Mohd. H.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Public Library of Science 2016
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4811568/
https://www.ncbi.nlm.nih.gov/pubmed/27022732
http://dx.doi.org/10.1371/journal.pone.0152318

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4811568/
https://www.ncbi.nlm.nih.gov/pubmed/27022732
http://dx.doi.org/10.1371/journal.pone.0152318

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