Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer extreme-ultraviolet stepper mirrors require the highest attainable reflectivity at 13 nm (nearly 70 %), but the cent...

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Detalles Bibliográficos
Autores principales: Tarrio, Charles, Grantham, Steven, Squires, Matthew B., Vest, Robert E., Lucatorto, Thomas B.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 2003
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4846234/
https://www.ncbi.nlm.nih.gov/pubmed/27413610
http://dx.doi.org/10.6028/jres.108.025

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4846234/
https://www.ncbi.nlm.nih.gov/pubmed/27413610
http://dx.doi.org/10.6028/jres.108.025

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