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Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices
We report a one-step polymer-free approach to patterning graphene using a stencil mask and oxygen plasma reactive-ion etching, with a subsequent polymer-free direct transfer for flexible graphene devices. Our stencil mask is fabricated via a subtractive, laser cutting manufacturing technique, follow...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4846816/ https://www.ncbi.nlm.nih.gov/pubmed/27118249 http://dx.doi.org/10.1038/srep24890 |
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author | Yong, Keong Ashraf, Ali Kang, Pilgyu Nam, SungWoo |
author_facet | Yong, Keong Ashraf, Ali Kang, Pilgyu Nam, SungWoo |
author_sort | Yong, Keong |
collection | PubMed |
description | We report a one-step polymer-free approach to patterning graphene using a stencil mask and oxygen plasma reactive-ion etching, with a subsequent polymer-free direct transfer for flexible graphene devices. Our stencil mask is fabricated via a subtractive, laser cutting manufacturing technique, followed by lamination of stencil mask onto graphene grown on Cu foil for patterning. Subsequently, micro-sized graphene features of various shapes are patterned via reactive-ion etching. The integrity of our graphene after patterning is confirmed by Raman spectroscopy. We further demonstrate the rapid prototyping capability of a stretchable, crumpled graphene strain sensor and patterned graphene condensation channels for potential applications in sensing and heat transfer, respectively. We further demonstrate that the polymer-free approach for both patterning and transfer to flexible substrates allows the realization of cleaner graphene features as confirmed by water contact angle measurements. We believe that our new method promotes rapid, facile fabrication of cleaner graphene devices, and can be extended to other two dimensional materials in the future. |
format | Online Article Text |
id | pubmed-4846816 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Nature Publishing Group |
record_format | MEDLINE/PubMed |
spelling | pubmed-48468162016-04-29 Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices Yong, Keong Ashraf, Ali Kang, Pilgyu Nam, SungWoo Sci Rep Article We report a one-step polymer-free approach to patterning graphene using a stencil mask and oxygen plasma reactive-ion etching, with a subsequent polymer-free direct transfer for flexible graphene devices. Our stencil mask is fabricated via a subtractive, laser cutting manufacturing technique, followed by lamination of stencil mask onto graphene grown on Cu foil for patterning. Subsequently, micro-sized graphene features of various shapes are patterned via reactive-ion etching. The integrity of our graphene after patterning is confirmed by Raman spectroscopy. We further demonstrate the rapid prototyping capability of a stretchable, crumpled graphene strain sensor and patterned graphene condensation channels for potential applications in sensing and heat transfer, respectively. We further demonstrate that the polymer-free approach for both patterning and transfer to flexible substrates allows the realization of cleaner graphene features as confirmed by water contact angle measurements. We believe that our new method promotes rapid, facile fabrication of cleaner graphene devices, and can be extended to other two dimensional materials in the future. Nature Publishing Group 2016-04-27 /pmc/articles/PMC4846816/ /pubmed/27118249 http://dx.doi.org/10.1038/srep24890 Text en Copyright © 2016, Macmillan Publishers Limited http://creativecommons.org/licenses/by/4.0/ This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
spellingShingle | Article Yong, Keong Ashraf, Ali Kang, Pilgyu Nam, SungWoo Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices |
title | Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices |
title_full | Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices |
title_fullStr | Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices |
title_full_unstemmed | Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices |
title_short | Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices |
title_sort | rapid stencil mask fabrication enabled one-step polymer-free graphene patterning and direct transfer for flexible graphene devices |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4846816/ https://www.ncbi.nlm.nih.gov/pubmed/27118249 http://dx.doi.org/10.1038/srep24890 |
work_keys_str_mv | AT yongkeong rapidstencilmaskfabricationenabledonesteppolymerfreegraphenepatterninganddirecttransferforflexiblegraphenedevices AT ashrafali rapidstencilmaskfabricationenabledonesteppolymerfreegraphenepatterninganddirecttransferforflexiblegraphenedevices AT kangpilgyu rapidstencilmaskfabricationenabledonesteppolymerfreegraphenepatterninganddirecttransferforflexiblegraphenedevices AT namsungwoo rapidstencilmaskfabricationenabledonesteppolymerfreegraphenepatterninganddirecttransferforflexiblegraphenedevices |