Barrier Modification of Metal-contact on Silicon by Sub-2 nm Platinum Nanoparticles and Thin Dielectrics

We report metal/p-Si contact barrier modification through the introduction of either “isolated” or “nonisolated” tilted-target-sputtered sub-2 nm platinum nanoparticles (Pt NPs) in combination with either a 0.98 nm Atomic Layer Deposited Al(2)O(3) or a 1.6 nm chemically grown SiO(2) dielectric layer...

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Detalles Bibliográficos
Autores principales: Zheng, Haisheng, Mahajan, Bikram K., Su, Sheng C., Mukherjee, Somik, Gangopadhyay, Keshab, Gangopadhyay, Shubhra
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4848504/
https://www.ncbi.nlm.nih.gov/pubmed/27121605
http://dx.doi.org/10.1038/srep25234

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4848504/
https://www.ncbi.nlm.nih.gov/pubmed/27121605
http://dx.doi.org/10.1038/srep25234

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