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Barrier Modification of Metal-contact on Silicon by Sub-2 nm Platinum Nanoparticles and Thin Dielectrics
We report metal/p-Si contact barrier modification through the introduction of either “isolated” or “nonisolated” tilted-target-sputtered sub-2 nm platinum nanoparticles (Pt NPs) in combination with either a 0.98 nm Atomic Layer Deposited Al(2)O(3) or a 1.6 nm chemically grown SiO(2) dielectric layer...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2016
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4848504/ https://www.ncbi.nlm.nih.gov/pubmed/27121605 http://dx.doi.org/10.1038/srep25234 |