Characterization of Graphene-based FET Fabricated using a Shadow Mask

To pattern electrical metal contacts, electron beam lithography or photolithography are commonly utilized, and these processes require polymer resists with solvents. During the patterning process the graphene surface is exposed to chemicals, and the residue on the graphene surface was unable to be c...

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Detalles Bibliográficos
Autores principales: Tien, Dung Hoang, Park, Jun-Young, Kim, Ki Buem, Lee, Naesung, Seo, Yongho
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4864380/
https://www.ncbi.nlm.nih.gov/pubmed/27169620
http://dx.doi.org/10.1038/srep25050

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4864380/
https://www.ncbi.nlm.nih.gov/pubmed/27169620
http://dx.doi.org/10.1038/srep25050

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