Europium Silicide – a Prospective Material for Contacts with Silicon

Metal-silicon junctions are crucial to the operation of semiconductor devices: aggressive scaling demands low-resistive metallic terminals to replace high-doped silicon in transistors. It suggests an efficient charge injection through a low Schottky barrier between a metal and Si. Tremendous efforts...

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Detalles Bibliográficos
Autores principales: Averyanov, Dmitry V., Tokmachev, Andrey M., Karateeva, Christina G., Karateev, Igor A., Lobanovich, Eduard F., Prutskov, Grigory V., Parfenov, Oleg E., Taldenkov, Alexander N., Vasiliev, Alexander L., Storchak, Vyacheslav G.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4876492/
https://www.ncbi.nlm.nih.gov/pubmed/27211700
http://dx.doi.org/10.1038/srep25980

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4876492/
https://www.ncbi.nlm.nih.gov/pubmed/27211700
http://dx.doi.org/10.1038/srep25980

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