Interface Engineering for the Enhancement of Carrier Transport in Black Phosphorus Transistor with Ultra-Thin High-k Gate Dielectric

Black phosphorus (BP) is the most stable allotrope of phosphorus which exhibits strong in-plane anisotropic charge transport. Discovering its interface properties between BP and high-k gate dielectric is fundamentally important for enhancing the carrier mobility and electrostatics control. Here, we...

Descripción completa

Detalles Bibliográficos
Autores principales: Ling, Zhi-Peng, Zhu, Jun-Tao, Liu, Xinke, Ang, Kah-Wee
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4879535/
https://www.ncbi.nlm.nih.gov/pubmed/27222074
http://dx.doi.org/10.1038/srep26609

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4879535/
https://www.ncbi.nlm.nih.gov/pubmed/27222074
http://dx.doi.org/10.1038/srep26609

Ejemplares similares