Deposition of Diamond Films in a Closed Hot Filament CVD System

A closed system hot filament chemical vapor deposition (CVD) reactor has been used to deposit diamond films on silicon substrates. A fixed charge of hydrogen gas is fed into the deposition system until the desired deposition pressure level is reached. A solid graphite cylindrical rod held above the...

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Detalles Bibliográficos
Autores principales: Lai, Guan-Ren, Farabaugh, E. N., Feldman, A., Robins, L. H.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1995
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887217/
https://www.ncbi.nlm.nih.gov/pubmed/29151726
http://dx.doi.org/10.6028/jres.100.004

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887217/
https://www.ncbi.nlm.nih.gov/pubmed/29151726
http://dx.doi.org/10.6028/jres.100.004

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