Deposition of Diamond Films in a Closed Hot Filament CVD System

A closed system hot filament chemical vapor deposition (CVD) reactor has been used to deposit diamond films on silicon substrates. A fixed charge of hydrogen gas is fed into the deposition system until the desired deposition pressure level is reached. A solid graphite cylindrical rod held above the...

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Detalles Bibliográficos
Autores principales: Lai, Guan-Ren, Farabaugh, E. N., Feldman, A., Robins, L. H.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1995
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887217/
https://www.ncbi.nlm.nih.gov/pubmed/29151726
http://dx.doi.org/10.6028/jres.100.004
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author Lai, Guan-Ren
Farabaugh, E. N.
Feldman, A.
Robins, L. H.
author_facet Lai, Guan-Ren
Farabaugh, E. N.
Feldman, A.
Robins, L. H.
author_sort Lai, Guan-Ren
collection PubMed
description A closed system hot filament chemical vapor deposition (CVD) reactor has been used to deposit diamond films on silicon substrates. A fixed charge of hydrogen gas is fed into the deposition system until the desired deposition pressure level is reached. A solid graphite cylindrical rod held above the tungsten filament was the carbon source. System parameters for diamond film growth have been determined. The diamond structure of the films has been verified by x-ray diffraction (XRD). Morphology typical of CVD diamond films has been observed in scanning electron microscopy (SEM). The quality of the diamond films has been evaluated by micro-Raman spectroscopy.
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spelling pubmed-48872172017-11-17 Deposition of Diamond Films in a Closed Hot Filament CVD System Lai, Guan-Ren Farabaugh, E. N. Feldman, A. Robins, L. H. J Res Natl Inst Stand Technol Article A closed system hot filament chemical vapor deposition (CVD) reactor has been used to deposit diamond films on silicon substrates. A fixed charge of hydrogen gas is fed into the deposition system until the desired deposition pressure level is reached. A solid graphite cylindrical rod held above the tungsten filament was the carbon source. System parameters for diamond film growth have been determined. The diamond structure of the films has been verified by x-ray diffraction (XRD). Morphology typical of CVD diamond films has been observed in scanning electron microscopy (SEM). The quality of the diamond films has been evaluated by micro-Raman spectroscopy. [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1995 /pmc/articles/PMC4887217/ /pubmed/29151726 http://dx.doi.org/10.6028/jres.100.004 Text en https://creativecommons.org/publicdomain/zero/1.0/ The Journal of Research of the National Institute of Standards and Technology is a publication of the U.S. Government. The papers are in the public domain and are not subject to copyright in the United States. Articles from J Res may contain photographs or illustrations copyrighted by other commercial organizations or individuals that may not be used without obtaining prior approval from the holder of the copyright.
spellingShingle Article
Lai, Guan-Ren
Farabaugh, E. N.
Feldman, A.
Robins, L. H.
Deposition of Diamond Films in a Closed Hot Filament CVD System
title Deposition of Diamond Films in a Closed Hot Filament CVD System
title_full Deposition of Diamond Films in a Closed Hot Filament CVD System
title_fullStr Deposition of Diamond Films in a Closed Hot Filament CVD System
title_full_unstemmed Deposition of Diamond Films in a Closed Hot Filament CVD System
title_short Deposition of Diamond Films in a Closed Hot Filament CVD System
title_sort deposition of diamond films in a closed hot filament cvd system
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887217/
https://www.ncbi.nlm.nih.gov/pubmed/29151726
http://dx.doi.org/10.6028/jres.100.004
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AT robinslh depositionofdiamondfilmsinaclosedhotfilamentcvdsystem

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