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Dusty Plasma Studies in the Gaseous Electronics Conference Reference Cell
Particle “dust” in processing plasmas is of critical concern to the semiconductor industry because of the threat particles pose to device yield. A number of important investigations into the formation, growth, charging, transport and consequences of particulate dust in plasmas have been made using t...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1995
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887230/ https://www.ncbi.nlm.nih.gov/pubmed/29151754 http://dx.doi.org/10.6028/jres.100.034 |