X-Ray Lithography Mask Metrology: Use of Transmitted Electrons in an SEM for Linewidth Measurement

X-ray masks present a measurement object that is different from most other objects used in semiconductor processing because the support membrane is, by design, x-ray transparent. This characteristic can be used as an advantage in electron beam-based x-ray mask metrology since, depending upon the inc...

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Detalles Bibliográficos
Autores principales: Postek, Michael T., Lowney, Jeremiah R., Vladar, Andras E., Keery, William J., Marx, Egon, Larrabee, Robert D.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology 1993
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4907699/
https://www.ncbi.nlm.nih.gov/pubmed/28053482
http://dx.doi.org/10.6028/jres.098.032

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4907699/
https://www.ncbi.nlm.nih.gov/pubmed/28053482
http://dx.doi.org/10.6028/jres.098.032

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