Spatially Multiplexed Micro-Spectrophotometry in Bright Field Mode for Thin Film Characterization

Thickness characterization of thin films is of primary importance in a variety of nanotechnology applications, either in the semiconductor industry, quality control in nanofabrication processes or engineering of nanoelectromechanical systems (NEMS) because small thickness variability can strongly co...

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Detalles Bibliográficos
Autores principales: Pini, Valerio, Kosaka, Priscila M., Ruz, Jose J., Malvar, Oscar, Encinar, Mario, Tamayo, Javier, Calleja, Montserrat
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4934351/
https://www.ncbi.nlm.nih.gov/pubmed/27338398
http://dx.doi.org/10.3390/s16060926

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4934351/
https://www.ncbi.nlm.nih.gov/pubmed/27338398
http://dx.doi.org/10.3390/s16060926

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