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Spatially Multiplexed Micro-Spectrophotometry in Bright Field Mode for Thin Film Characterization
Thickness characterization of thin films is of primary importance in a variety of nanotechnology applications, either in the semiconductor industry, quality control in nanofabrication processes or engineering of nanoelectromechanical systems (NEMS) because small thickness variability can strongly co...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2016
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4934351/ https://www.ncbi.nlm.nih.gov/pubmed/27338398 http://dx.doi.org/10.3390/s16060926 |