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On the Crystal Structural Control of Sputtered TiO(2) Thin Films
In this study, we focused on the origin on the selective deposition of rutile and anatase TiO(2) thin films during the sputtering process. The observation on microstructural evolution of the TiO(2) films by transmission electron microscopy revealed the coexistence of rutile and anatase TiO(2) phases...
Autores principales: | , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4936979/ https://www.ncbi.nlm.nih.gov/pubmed/27389344 http://dx.doi.org/10.1186/s11671-016-1531-5 |
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author | Jia, Junjun Yamamoto, Haruka Okajima, Toshihiro Shigesato, Yuzo |
author_facet | Jia, Junjun Yamamoto, Haruka Okajima, Toshihiro Shigesato, Yuzo |
author_sort | Jia, Junjun |
collection | PubMed |
description | In this study, we focused on the origin on the selective deposition of rutile and anatase TiO(2) thin films during the sputtering process. The observation on microstructural evolution of the TiO(2) films by transmission electron microscopy revealed the coexistence of rutile and anatase TiO(2) phases in the initial stage under the preferential growth conditions for the anatase TiO(2); the observations further revealed that the anatase phase gradually dominated the crystal structure with increasing film thickness. These results suggest that the bombardment during the sputtering deposition did not obviously affect the TiO(2) crystal structure, and this was also confirmed by off-axis magnetron sputtering experiments. We also investigated the mechanism of the effect of Sn impurity doping on the crystal structure using first-principles calculations. It is found that the formation energy of Sn-doped rutile TiO(2) is lower than that of Sn-doped anatase TiO(2); this suggests that the Sn-doped TiO(2) favours the rutile phase. These results offer a guideline for the utilization of selective deposition of rutile and anatase TiO(2) thin films in various industrial applications. |
format | Online Article Text |
id | pubmed-4936979 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-49369792016-07-08 On the Crystal Structural Control of Sputtered TiO(2) Thin Films Jia, Junjun Yamamoto, Haruka Okajima, Toshihiro Shigesato, Yuzo Nanoscale Res Lett Nano Express In this study, we focused on the origin on the selective deposition of rutile and anatase TiO(2) thin films during the sputtering process. The observation on microstructural evolution of the TiO(2) films by transmission electron microscopy revealed the coexistence of rutile and anatase TiO(2) phases in the initial stage under the preferential growth conditions for the anatase TiO(2); the observations further revealed that the anatase phase gradually dominated the crystal structure with increasing film thickness. These results suggest that the bombardment during the sputtering deposition did not obviously affect the TiO(2) crystal structure, and this was also confirmed by off-axis magnetron sputtering experiments. We also investigated the mechanism of the effect of Sn impurity doping on the crystal structure using first-principles calculations. It is found that the formation energy of Sn-doped rutile TiO(2) is lower than that of Sn-doped anatase TiO(2); this suggests that the Sn-doped TiO(2) favours the rutile phase. These results offer a guideline for the utilization of selective deposition of rutile and anatase TiO(2) thin films in various industrial applications. Springer US 2016-07-07 /pmc/articles/PMC4936979/ /pubmed/27389344 http://dx.doi.org/10.1186/s11671-016-1531-5 Text en © The Author(s). 2016 Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. |
spellingShingle | Nano Express Jia, Junjun Yamamoto, Haruka Okajima, Toshihiro Shigesato, Yuzo On the Crystal Structural Control of Sputtered TiO(2) Thin Films |
title | On the Crystal Structural Control of Sputtered TiO(2) Thin Films |
title_full | On the Crystal Structural Control of Sputtered TiO(2) Thin Films |
title_fullStr | On the Crystal Structural Control of Sputtered TiO(2) Thin Films |
title_full_unstemmed | On the Crystal Structural Control of Sputtered TiO(2) Thin Films |
title_short | On the Crystal Structural Control of Sputtered TiO(2) Thin Films |
title_sort | on the crystal structural control of sputtered tio(2) thin films |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4936979/ https://www.ncbi.nlm.nih.gov/pubmed/27389344 http://dx.doi.org/10.1186/s11671-016-1531-5 |
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