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Resolution enhancement using plasmonic metamask for wafer-scale photolithography in the far field

Resolution enhancement in far-field photolithography is demonstrated using a plasmonic metamask in the proximity regime, in which Fresnel diffraction is dominant. The transverse magnetic component of the diffracted wave from the photomask, which reduces the pattern visibility and lowers the resoluti...

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Detalles Bibliográficos
Autores principales: Baek, Seunghwa, Kang, Gumin, Kang, Min, Lee, Chang-Won, Kim, Kyoungsik
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4960539/
https://www.ncbi.nlm.nih.gov/pubmed/27457127
http://dx.doi.org/10.1038/srep30476