Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics

The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static e...

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Detalles Bibliográficos
Autores principales: Ye, Xin, Huang, Jin, Liu, Hongjie, Geng, Feng, Sun, Laixi, Jiang, Xiaodong, Wu, Weidong, Qiao, Liang, Zu, Xiaotao, Zheng, Wanguo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4971457/
https://www.ncbi.nlm.nih.gov/pubmed/27484188
http://dx.doi.org/10.1038/srep31111

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4971457/
https://www.ncbi.nlm.nih.gov/pubmed/27484188
http://dx.doi.org/10.1038/srep31111

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