Large-area, continuous and high electrical performances of bilayer to few layers MoS(2) fabricated by RF sputtering via post-deposition annealing method

We report a simple and mass-scalable approach for thin MoS(2) films via RF sputtering combined with the post-deposition annealing process. We have prepared as-sputtered film using a MoS(2) target in the sputtering system. The as-sputtered film was subjected to post-deposition annealing to improve cr...

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Detalles Bibliográficos
Autores principales: Hussain, Sajjad, Singh, Jai, Vikraman, Dhanasekaran, Singh, Arun Kumar, Iqbal, Muhammad Zahir, Khan, Muhammad Farooq, Kumar, Pushpendra, Choi, Dong-Chul, Song, Wooseok, An, Ki-Seok, Eom, Jonghwa, Lee, Wan-Gyu, Jung, Jongwan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974610/
https://www.ncbi.nlm.nih.gov/pubmed/27492282
http://dx.doi.org/10.1038/srep30791

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974610/
https://www.ncbi.nlm.nih.gov/pubmed/27492282
http://dx.doi.org/10.1038/srep30791

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