Selective directed self-assembly of coexisting morphologies using block copolymer blends

Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. Here we expand on traditional DSA chemical patterning. A blend of lamellar- and cylinder-forming block copolymers assembles...

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Detalles Bibliográficos
Autores principales: Stein, A., Wright, G., Yager, K. G., Doerk, G. S., Black, C. T.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974660/
https://www.ncbi.nlm.nih.gov/pubmed/27480327
http://dx.doi.org/10.1038/ncomms12366

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4974660/
https://www.ncbi.nlm.nih.gov/pubmed/27480327
http://dx.doi.org/10.1038/ncomms12366

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