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Nanolithography using Bessel Beams of Extreme Ultraviolet Wavelength
Bessel beams are nondiffracting light beams with large depth-of-focus and self-healing properties, making them suitable as a serial beam writing tool over surfaces with arbitrary topography. This property breaks the inherent resolution vs. depth-of-focus tradeoff of photolithography. One approach fo...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Nature Publishing Group
2016
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4977501/ https://www.ncbi.nlm.nih.gov/pubmed/27501749 http://dx.doi.org/10.1038/srep31301 |