Directed self-assembly of block copolymer films on atomically-thin graphene chemical patterns

Directed self-assembly of block copolymers is a scalable method to fabricate well-ordered patterns over the wafer scale with feature sizes below the resolution of conventional lithography. Typically, lithographically-defined prepatterns with varying chemical contrast are used to rationally guide the...

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Detalles Bibliográficos
Autores principales: Chang, Tzu-Hsuan, Xiong, Shisheng, Jacobberger, Robert M., Mikael, Solomon, Suh, Hyo Seon, Liu, Chi-Chun, Geng, Dalong, Wang, Xudong, Arnold, Michael S., Ma, Zhenqiang, Nealey, Paul F.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4985650/
https://www.ncbi.nlm.nih.gov/pubmed/27528258
http://dx.doi.org/10.1038/srep31407

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4985650/
https://www.ncbi.nlm.nih.gov/pubmed/27528258
http://dx.doi.org/10.1038/srep31407

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