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Hydrogen-plasma-induced Rapid, Low-Temperature Crystallization of μm-thick a-Si:H Films
Being a low-cost, mass-production-compatible route to attain crystalline silicon, post-deposition crystallization of amorphous silicon has received intensive research interest. Here we report a low-temperature (300 °C), rapid (crystallization rate of ~17 nm/min) means of a-Si:H crystallization based...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group
2016
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5013535/ https://www.ncbi.nlm.nih.gov/pubmed/27600866 http://dx.doi.org/10.1038/srep32716 |