Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by atomic layer deposition technique is reported in this work. With the increasing Al doping level, the evolution from (002) to (100) diffraction peaks indicates the change in growth mode of ZnO films. Spect...

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Detalles Bibliográficos
Autores principales: Zhai, Chen-Hui, Zhang, Rong-Jun, Chen, Xin, Zheng, Yu-Xiang, Wang, Song-You, Liu, Juan, Dai, Ning, Chen, Liang-Yao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2016
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5026983/
https://www.ncbi.nlm.nih.gov/pubmed/27639580
http://dx.doi.org/10.1186/s11671-016-1625-0

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5026983/
https://www.ncbi.nlm.nih.gov/pubmed/27639580
http://dx.doi.org/10.1186/s11671-016-1625-0

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