Ultra-low thermal conductivities in large-area Si-Ge nanomeshes for thermoelectric applications

In this work, we measure the thermal and thermoelectric properties of large-area Si(0.8)Ge(0.2) nano-meshed films fabricated by DC sputtering of Si(0.8)Ge(0.2) on highly ordered porous alumina matrices. The Si(0.8)Ge(0.2) film replicated the porous alumina structure resulting in nano-meshed films. V...

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Detalles Bibliográficos
Autores principales: Perez-Taborda, Jaime Andres, Muñoz Rojo, Miguel, Maiz, Jon, Neophytou, Neophytos, Martin-Gonzalez, Marisol
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5030677/
https://www.ncbi.nlm.nih.gov/pubmed/27650202
http://dx.doi.org/10.1038/srep32778

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5030677/
https://www.ncbi.nlm.nih.gov/pubmed/27650202
http://dx.doi.org/10.1038/srep32778

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