4-Nitrobenzene Grafted in Porous Silicon: Application to Optical Lithography

In this work, we report a method to process porous silicon to improve its chemical resistance to alkaline solution attacks based on the functionalization of the pore surface by the electrochemical reduction of 4-nitrobenzendiazonium salt. This method provides porous silicon with strong resistance to...

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Detalles Bibliográficos
Autores principales: Tiddia, Mariavitalia, Mula, Guido, Sechi, Elisa, Vacca, Annalisa, Cara, Eleonora, De Leo, Natascia, Fretto, Matteo, Boarino, Luca
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2016
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5042913/
https://www.ncbi.nlm.nih.gov/pubmed/27686091
http://dx.doi.org/10.1186/s11671-016-1654-8

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5042913/
https://www.ncbi.nlm.nih.gov/pubmed/27686091
http://dx.doi.org/10.1186/s11671-016-1654-8

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