Applying a punch with microridges in multistage deep drawing processes

The developers of high aspect ratio components aim to minimize the processing stages in deep drawing processes. This study elucidates the application of microridge punches in multistage deep drawing processes. A microridge punch improves drawing performance, thereby reducing the number of stages req...

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Detalles Bibliográficos
Autores principales: Lin, Bor-Tsuen, Yang, Cheng-Yu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer International Publishing 2016
Materias:
Research
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5053966/
https://www.ncbi.nlm.nih.gov/pubmed/27777869
http://dx.doi.org/10.1186/s40064-016-3371-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5053966/
https://www.ncbi.nlm.nih.gov/pubmed/27777869
http://dx.doi.org/10.1186/s40064-016-3371-2

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