Atomic Layer Deposition for Coating of High Aspect Ratio TiO(2) Nanotube Layers

[Image: see text] We present an optimized approach for the deposition of Al(2)O(3) (as a model secondary material) coating into high aspect ratio (≈180) anodic TiO(2) nanotube layers using the atomic layer deposition (ALD) process. In order to study the influence of the diffusion of the Al(2)O(3) pr...

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Detalles Bibliográficos
Autores principales: Zazpe, Raul, Knaut, Martin, Sopha, Hanna, Hromadko, Ludek, Albert, Matthias, Prikryl, Jan, Gärtnerová, V., Bartha, Johann W., Macak, Jan M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2016
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5072108/
https://www.ncbi.nlm.nih.gov/pubmed/27643411
http://dx.doi.org/10.1021/acs.langmuir.6b03119

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5072108/
https://www.ncbi.nlm.nih.gov/pubmed/27643411
http://dx.doi.org/10.1021/acs.langmuir.6b03119

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