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Atomic Layer Deposition for Coating of High Aspect Ratio TiO(2) Nanotube Layers
[Image: see text] We present an optimized approach for the deposition of Al(2)O(3) (as a model secondary material) coating into high aspect ratio (≈180) anodic TiO(2) nanotube layers using the atomic layer deposition (ALD) process. In order to study the influence of the diffusion of the Al(2)O(3) pr...
Autores principales: | Zazpe, Raul, Knaut, Martin, Sopha, Hanna, Hromadko, Ludek, Albert, Matthias, Prikryl, Jan, Gärtnerová, V., Bartha, Johann W., Macak, Jan M. |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American
Chemical Society
2016
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5072108/ https://www.ncbi.nlm.nih.gov/pubmed/27643411 http://dx.doi.org/10.1021/acs.langmuir.6b03119 |
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