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Rapid sintering of silicon nitride foams decorated with one-dimensional nanostructures by intense thermal radiation
Silicon nitride foams were prepared by direct foaming and subsequent rapid sintering at 1600 °C. The intense thermal radiation generated under the pressureless spark plasma sintering condition facilitated necking of Si(3)N(4) grains. The prepared foams possessed a porosity of ∼80 vol% and a compress...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Taylor & Francis
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5090692/ https://www.ncbi.nlm.nih.gov/pubmed/27877704 http://dx.doi.org/10.1088/1468-6996/15/4/045003 |