Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. [Image:...

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Detalles Bibliográficos
Autores principales: Jeong, Hyeon‐Ho, Mark, Andrew G., Lee, Tung‐Chun, Son, Kwanghyo, Chen, Wenwen, Alarcón‐Correa, Mariana, Kim, Insook, Schütz, Gisela, Fischer, Peer
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2015
Materias:
Communications
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115431/
https://www.ncbi.nlm.nih.gov/pubmed/27980957
http://dx.doi.org/10.1002/advs.201500016

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115431/
https://www.ncbi.nlm.nih.gov/pubmed/27980957
http://dx.doi.org/10.1002/advs.201500016

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