Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications

A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. [Image:...

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Detalles Bibliográficos
Autores principales: Jeong, Hyeon‐Ho, Mark, Andrew G., Lee, Tung‐Chun, Son, Kwanghyo, Chen, Wenwen, Alarcón‐Correa, Mariana, Kim, Insook, Schütz, Gisela, Fischer, Peer
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2015
Materias:
Communications
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115431/
https://www.ncbi.nlm.nih.gov/pubmed/27980957
http://dx.doi.org/10.1002/advs.201500016
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author Jeong, Hyeon‐Ho
Mark, Andrew G.
Lee, Tung‐Chun
Son, Kwanghyo
Chen, Wenwen
Alarcón‐Correa, Mariana
Kim, Insook
Schütz, Gisela
Fischer, Peer
author_facet Jeong, Hyeon‐Ho
Mark, Andrew G.
Lee, Tung‐Chun
Son, Kwanghyo
Chen, Wenwen
Alarcón‐Correa, Mariana
Kim, Insook
Schütz, Gisela
Fischer, Peer
author_sort Jeong, Hyeon‐Ho
collection PubMed
description A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. [Image: see text]
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spelling pubmed-51154312016-12-15 Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications Jeong, Hyeon‐Ho Mark, Andrew G. Lee, Tung‐Chun Son, Kwanghyo Chen, Wenwen Alarcón‐Correa, Mariana Kim, Insook Schütz, Gisela Fischer, Peer Adv Sci (Weinh) Communications A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch‐mask applications. [Image: see text] John Wiley and Sons Inc. 2015-05-06 /pmc/articles/PMC5115431/ /pubmed/27980957 http://dx.doi.org/10.1002/advs.201500016 Text en © 2015 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the Creative Commons Attribution (http://creativecommons.org/licenses/by/4.0/) License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
spellingShingle Communications
Jeong, Hyeon‐Ho
Mark, Andrew G.
Lee, Tung‐Chun
Son, Kwanghyo
Chen, Wenwen
Alarcón‐Correa, Mariana
Kim, Insook
Schütz, Gisela
Fischer, Peer
Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
title Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
title_full Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
title_fullStr Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
title_full_unstemmed Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
title_short Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications
title_sort selectable nanopattern arrays for nanolithographic imprint and etch‐mask applications
topic Communications
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5115431/
https://www.ncbi.nlm.nih.gov/pubmed/27980957
http://dx.doi.org/10.1002/advs.201500016
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